选择区域外延生长叠层电吸收调制激光器结构的制作方法


Autoria(s): 朱洪亮; 李宝霞; 张靖; 王圩
Data(s)

22/03/2006

Resumo

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Identificador

http://ir.semi.ac.cn/handle/172111/3199

http://www.irgrid.ac.cn/handle/1471x/61081

Idioma(s)

中文

Fonte

朱洪亮;李宝霞;张靖;王圩,选择区域外延生长叠层电吸收调制激光器结构的制作方法 ,CN200510004571.3,20050118

Tipo

专利