在Si基片上生长高密度超小型Ge量子点的方法


Autoria(s): 时文华; 李传波; 王容伟; 罗丽萍; 王启明
Data(s)

15/03/2006

Resumo

Submitted by zhangdi (zhangdi@red.semi.ac.cn) on 2009-06-04T08:36:34Z No. of bitstreams: 1 dspace.cfg: 33388 bytes, checksum: ac9630d3fdb36a155287a049e8b34eb7 (MD5)

Made available in DSpace on 2009-06-04T08:36:35Z (GMT). No. of bitstreams: 1 dspace.cfg: 33388 bytes, checksum: ac9630d3fdb36a155287a049e8b34eb7 (MD5) Previous issue date: 2008-08

Made available in DSpace on 2009-06-11T08:57:43Z (GMT). No. of bitstreams: 1 full/200410074362.pdf: 415954 bytes, checksum: c90f0f139a92214a6ba2d6ee2712aad1 (MD5) Previous issue date:

Identificador

http://ir.semi.ac.cn/handle/172111/3193

http://www.irgrid.ac.cn/handle/1471x/61078

Idioma(s)

中文

Fonte

时文华;李传波;王容伟;罗丽萍;王启明,在Si基片上生长高密度超小型Ge量子点的方法 ,CN200410074362.1,20040910

Tipo

专利