氮化镓高电子迁移率晶体管的结构及制作方法


Autoria(s): 王晓亮; 胡国新; 王军喜; 曾一平; 李晋闽
Data(s)

07/12/2005

Resumo

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Identificador

http://ir.semi.ac.cn/handle/172111/3129

http://www.irgrid.ac.cn/handle/1471x/61046

Idioma(s)

中文

Fonte

王晓亮;胡国新;王军喜;曾一平;李晋闽,氮化镓高电子迁移率晶体管的结构及制作方法 ,CN200410046195.X,20040602

Tipo

专利