一种用于低能离子束材料制备方法的离子源装置


Autoria(s): 杨少延; 刘志凯; 柴春林; 蒋渭生
Data(s)

29/06/2005

Resumo

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Identificador

http://ir.semi.ac.cn/handle/172111/2793

http://www.irgrid.ac.cn/handle/1471x/60878

Idioma(s)

中文

Fonte

杨少延;刘志凯;柴春林;蒋渭生,一种用于低能离子束材料制备方法的离子源装置 ,CN200310121178.3,20031222

Tipo

专利