磁控溅射方法制备碳化硅薄膜工艺
| Data(s) |
16/03/2005
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| Resumo |
Submitted by zhangdi (zhangdi@red.semi.ac.cn) on 2009-06-04T08:36:34Z No. of bitstreams: 1 dspace.cfg: 33388 bytes, checksum: ac9630d3fdb36a155287a049e8b34eb7 (MD5) Made available in DSpace on 2009-06-04T08:36:35Z (GMT). No. of bitstreams: 1 dspace.cfg: 33388 bytes, checksum: ac9630d3fdb36a155287a049e8b34eb7 (MD5) Previous issue date: 2008-08 Made available in DSpace on 2009-06-11T08:57:23Z (GMT). No. of bitstreams: 1 full/03158500.pdf: 244074 bytes, checksum: 30b78508fbbb07d796733898be31e498 (MD5) Previous issue date: |
| Identificador | |
| Idioma(s) |
中文 |
| Fonte |
陈诺夫;杨霏;尹志岗;柴春林;吴金良,磁控溅射方法制备碳化硅薄膜工艺 ,CN03158500.0,20030910 |
| Tipo |
专利 |
