Fabrication of a Low-Loss SSC Using High-Dose Electron Beam Lithography Exposure With Negative PMMA Resist

A silicon-on-insulator optical fiber-to-waveguide spot-size converter (SSC) using Poly-MethylMethAcrylate (PMMA) is presented for integrated optical circuits. Unlike the conventional use of PMMA as a positive resist, it has been successfully used as a negative resist with high-dose electron exposure for the fabrication of ultrafine silicon wire waveguides. Additionally, this process is able to reduce the side-wall roughness, and substantially depresses the unwanted propagation loss. Exploiting this technology, the authors demonstrated that the SSC can improve coupling efficiency by as much as over 2.5 dB per coupling facet, compared with that of SSC fabricated with PMMA as a positive resist with the same dimension.

Submitted by 阎军 (yanj@red.semi.ac.cn) on 2010-04-22T14:02:59Z No. of bitstreams: 1 Fabrication of a Low-Loss SSC Using High-Dose Electron Beam Lithography Exposure With Negative PMMA Resist.pdf: 418945 bytes, checksum: 8a52cdc11e8b30bf9ce98206359a88af (MD5)

Submitted by 阎军 (yanj@red.semi.ac.cn) on 2010-04-22T14:02:59Z No. of bitstreams: 1 Fabrication of a Low-Loss SSC Using High-Dose Electron Beam Lithography Exposure With Negative PMMA Resist.pdf: 418945 bytes, checksum: 8a52cdc11e8b30bf9ce98206359a88af (MD5)

National Natural Science Foundation of China 60537010；National Basic Research Program of China 2006CB302803；National High Technology Program of China 2007CB613405 2006AA03Z424

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National Natural Science Foundation of China 60537010；National Basic Research Program of China 2006CB302803；National High Technology Program of China 2007CB613405 2006AA03Z424