PECVD和ICP刻蚀技术及应用
| Contribuinte(s) |
杨富华 |
|---|---|
| Data(s) |
2009
|
| Resumo |
Submitted by zhangdi (zhangdi@red.semi.ac.cn) on 2009-04-13T11:45:31Z Made available in DSpace on 2009-04-13T11:45:31Z (GMT). Made available in DSpace on 2009-09-10T06:08:20Z (GMT). No. of bitstreams: 1 disk/eh2009/liyan.pdf: 4406746 bytes, checksum: 108b89b9a4591259cf99160740a6029e (MD5) Previous issue date: 2009 |
| Identificador | |
| Idioma(s) |
中文 |
| Fonte |
李艳.PECVD和ICP刻蚀技术及应用.[博士].北京.中国科学院半导体研究所.2009 |
| Palavras-Chave | #微电子学与固体电子学 |
| Tipo |
学位论文 |
