GaN 基异质结中的极化效应及Si 衬底GaN 生长研究


Autoria(s): 郭伦春
Contribuinte(s)

王晓亮

Data(s)

2008

Resumo

Submitted by zhangdi (zhangdi@red.semi.ac.cn) on 2009-04-13T11:45:31Z

Made available in DSpace on 2009-04-13T11:45:31Z (GMT).

Made available in DSpace on 2009-07-09T01:36:58Z (GMT). No. of bitstreams: 1 disk/eh2008/glc.pdf: 2132857 bytes, checksum: 8f2582802b7379410d570020d3ffffcd (MD5) Previous issue date: 2008

Identificador

http://ir.semi.ac.cn/handle/172111/5867

http://www.irgrid.ac.cn/handle/1471x/60495

Idioma(s)

中文

Fonte

郭伦春.GaN 基异质结中的极化效应及Si 衬底GaN 生长研究.[博士].北京.中国科学院半导体研究所.2008

Palavras-Chave #微电子学与固体电子学
Tipo

学位论文