Si 和Ge 基稀磁半导体的研究


Autoria(s): 刘力锋
Contribuinte(s)

陈诺夫

Data(s)

2005

Resumo

Submitted by zhangdi (zhangdi@red.semi.ac.cn) on 2009-04-13T11:45:31Z

Made available in DSpace on 2009-04-13T11:45:31Z (GMT).

Made available in DSpace on 2009-07-09T01:36:06Z (GMT). No. of bitstreams: 1 disk/eh2005/llf.pdf: 2174865 bytes, checksum: d8f77775d0e159d08c3a606b9635be06 (MD5) Previous issue date: 2005

Identificador

http://ir.semi.ac.cn/handle/172111/5385

http://www.irgrid.ac.cn/handle/1471x/60254

Idioma(s)

中文

Fonte

刘力锋.Si 和Ge 基稀磁半导体的研究.[博士].北京.中国科学院半导体研究所.2005

Palavras-Chave #材料物理与化学
Tipo

学位论文