Si(111)衬底上GaN外延层的MOCVD生长与性质研究


Autoria(s): 伍墨
Contribuinte(s)

杨辉

Data(s)

2004

Resumo

Submitted by zhangdi (zhangdi@red.semi.ac.cn) on 2009-04-13T11:45:31Z

Made available in DSpace on 2009-04-13T11:45:31Z (GMT).

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Identificador

http://ir.semi.ac.cn/handle/172111/5323

http://www.irgrid.ac.cn/handle/1471x/60223

Idioma(s)

中文

Fonte

伍墨.Si(111)衬底上GaN外延层的MOCVD生长与性质研究.[硕士].北京.中国科学院半导体研究所.2004

Palavras-Chave #微电子学与固体电子学
Tipo

学位论文