HWCVD低温制备器件质量的微晶硅薄膜
| Contribuinte(s) |
朱美芳 |
|---|---|
| Data(s) |
2003
|
| Resumo |
Submitted by zhangdi (zhangdi@red.semi.ac.cn) on 2009-04-13T11:45:31Z Made available in DSpace on 2009-04-13T11:45:31Z (GMT). Made available in DSpace on 2009-07-09T01:35:53Z (GMT). No. of bitstreams: 1 disk/eh2003/wlj.pdf: 1469114 bytes, checksum: a2877e2d40f227ffc6b649676615e633 (MD5) Previous issue date: 2003 |
| Identificador | |
| Idioma(s) |
中文 |
| Fonte |
汪六九.HWCVD低温制备器件质量的微晶硅薄膜.[硕士].北京.中国科学院半导体研究所.2003 |
| Palavras-Chave | #材料物理与化学 |
| Tipo |
学位论文 |
