UHV/CVD生长弛豫SiGe和SiGe/Si II型量子阱的研究


Autoria(s): 李代宗
Contribuinte(s)

王启明

余金中

Data(s)

2000

Resumo

Submitted by zhangdi (zhangdi@red.semi.ac.cn) on 2009-04-13T11:45:31Z

Made available in DSpace on 2009-04-13T11:45:31Z (GMT).

Made available in DSpace on 2009-07-09T01:35:29Z (GMT). No. of bitstreams: 1 disk/eh2000/ldz.pdf: 19659727 bytes, checksum: e0f96a965e497ec677eab52ba5452001 (MD5) Previous issue date: 2000

Identificador

http://ir.semi.ac.cn/handle/172111/4985

http://www.irgrid.ac.cn/handle/1471x/60054

Idioma(s)

中文

Fonte

李代宗.UHV/CVD生长弛豫SiGe和SiGe/Si II型量子阱的研究.[博士].北京.中国科学院半导体研究所.2000

Palavras-Chave #半导体物理与半导体器件物理
Tipo

学位论文