Influences of deposition rate and oxygen partial pressure on residual stress and microstructure of YSZ thin films

Autoria(s): Xiao QL(肖祁陵); He HB(贺洪波); Shao SY(邵淑英); Shao JD(邵建达); Fan ZX(范正修)
Data(s)

2009
Identificador

http://ir.siom.ac.cn/handle/181231/6715

http://www.irgrid.ac.cn/handle/1471x/13001
Idioma(s)

中文
Fonte

肖祁陵,贺洪波,邵淑英,邵建达,范正修.Influences of deposition rate and oxygen partial pressure on residual stress and microstructure of YSZ thin films.Thin Solid Films,2009,517:
Tipo

期刊论文
Acesso ao item digital