PropertiesofHfO2 thin filmspreparedbydual-ion-beamreactivesputtering

Autoria(s): Dongping Zhang; PingFan; CongjuanWang; XingminCai; GuangxingLiang
Data(s)

2009
Identificador

http://ir.siom.ac.cn/handle/181231/6651

http://www.irgrid.ac.cn/handle/1471x/12995
Idioma(s)

中文
Fonte

Dongping Zhang,PingFan,CongjuanWang,XingminCai,GuangxingLiang.PropertiesofHfO2 thin filmspreparedbydual-ion-beamreactivesputtering.Optics&LaserTechnology,2009,41:
Tipo

期刊论文
Acesso ao item digital