Influence of plasma treatment on laser-induced damage characters of HfO2 thin films at 355nm

Autoria(s): Dongping Zhang; Congjuan Wang; Ping Fan; Xingmin Cai; Zhuanghao Zheng
Data(s)

11/05/2008
Identificador

http://ir.siom.ac.cn/handle/181231/6649

http://www.irgrid.ac.cn/handle/1471x/12993
Idioma(s)

中文
Fonte

Dongping Zhang,Congjuan Wang,Ping Fan, Xingmin Cai,Zhuanghao Zheng.Influence of plasma treatment on laser-induced damage characters of HfO2 thin films at 355nm.OPTICS EXPRESS,2008,17:
Tipo

期刊论文
Acesso ao item digital