Investigation on properties of TiO2 thin films deposited at different oxygen pressures


Autoria(s): Shen Yanming; Yu Hua; 姚建可; 邵淑英; 范正修; 贺洪波; 邵建达
Data(s)

2008

Resumo

TiO2 thin films were prepared by electron beam evaporation at different oxygen partial pressures. The influences of oxygen partial pressure on optical, mechanical and structural properties of TiO2 thin films were studied. The results showed that with the increase of oxygen partial pressure, the optical transmittance gradually increased, the transmittance edge gradually shifted to short wavelength, and the corresponding refractive index decreased. The residual stresses of all samples were tensile, and the value increased as oxygen partial pressure increasing, which corresponded to the evolutions of the packing densities. The structures of TiO2 thin films all were amorphous because deposition particles did not possess enough energy to crystallize. (C) 2007 Elsevier Ltd. All rights reserved.

Identificador

http://ir.siom.ac.cn/handle/181231/4714

http://www.irgrid.ac.cn/handle/1471x/12934

Idioma(s)

英语

Fonte

Shen Yanming;Yu Hua;姚建可;邵淑英;范正修;贺洪波;邵建达.,Opt. Laser Technol.,2008,40(3):550-554

Palavras-Chave #光学薄膜 #TiO2 thin films #residual stress #electron beam evaporation
Tipo

期刊论文