用不同的Mo靶溅射功率制备Mo/Si多层膜
Data(s) |
2007
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Resumo |
用磁控溅射法制备了周期厚度和周期数均相同的Mo/Si多层膜,用原子力显微镜和小角X射线衍射分别研究了Mo靶溅射功率不相同时,Mo/Si多层膜表面形貌和晶相的变化。随后在国家同步辐射实验室测量了Mo/Si多层膜的软X射线反射率。研究发现,随着Mo靶溅射功率的增大,Mo/Si多层膜的表面粗糙度增加,Mo的特征X射线衍射峰也增强,Mo/Si多层膜的软X射线峰值反射率先增大后减小。 abstract {Mo/Si multilayers were prepared by magnetron sputtering. With different sputtering power of Mo target, surface morphology and crystal phases of Mo/Si multilayers were studied by AFM and XRD. Soft X-ray reflectivity of Mo/Si multilayers were measured. As sputtering power of Mo target was increasing, surface roughness of Mo/Si film was increasing, characteristic diffraction peak of Mo species became stronger and stronger, furthermore, soft X-ray peak reflectivity of Mo/Si multilayers first increased and then reduced.} |
Identificador | |
Idioma(s) |
中文 |
Fonte |
秦俊岭;邵建达;易葵.用不同的Mo靶溅射功率制备Mo/Si多层膜,强激光与粒子束,2007,19(1):67-70 |
Palavras-Chave | #光学薄膜 #Mo靶 #Mo/Si多层膜 #溅射功率 #软X射线 #反射率 #Atomic force microscopy #Magnetron sputtering #Molybdenum #Reflection #Surface morphology #Surface roughness #X ray diffraction analysis #X rays |
Tipo |
期刊论文 |