HfO2薄膜的结构对抗激光损伤阈值的影响


Autoria(s): 高卫东; 张伟丽; 范树海; 张大伟; 邵建达; 范正修
Data(s)

2005

Resumo

利用蒸发氧化铪和离子辅助蒸发金属铪反应沉积氧化铪薄膜,对两种工艺下制备的氧化铪薄膜进行光学和结构以及激光损伤特性的研究,实验结果表明,用金属铪反应沉积的氧化铪薄膜不仅结构均匀,并且具有较高的激光损伤阈值.文章对损伤阈值和薄膜的结构及光学特性之间的关系进行了讨论。

HfO 2 films have been deposited with electron beam evaporation of HfO 2 and ion assisted electron beam evaporation of Hf. Optical and structural properties and laser induce damage threshold of the films have been studied; it was found that HfO 2 film deposited with electron beam evaporation of Hf with ion assisted technology shows uniform structural properties and higher laser induced damage threshold. The relation between structural and damage threshold of HfO 2 films has also been studied.

Identificador

http://ir.siom.ac.cn/handle/181231/4398

http://www.irgrid.ac.cn/handle/1471x/12776

Idioma(s)

中文

Fonte

高卫东;张伟丽;范树海;张大伟;邵建达;范正修.HfO2薄膜的结构对抗激光损伤阈值的影响,光子学报,2005,34(2):176-179

Palavras-Chave #光学薄膜 # #氧化铪 #薄膜 #激光损伤阈值 #HfO_2 Film #Laser-induced damage threshold
Tipo

期刊论文