基底微缺陷对介质薄膜光学性能影响的理论研究

基于非均匀膜理论提出一种存在微缺陷的介质基底的折射率分层模型，将基底依次分为表面层、亚表面层和体材料层，其中表面层和亚面层分别等效为折射率服从统计分布的非均匀膜，将它们分别再次细分为N1和N2个子层，每一子层均视为均匀介质膜．应用光学薄膜特征矩阵法对其进行理论分析，并对单层介质膜的光学性能进行数值计算．研究结果表明：基底的表面和亚表面微缺陷改变了薄膜和基底的等效折射率，导致了准Brewster角和组合反射率与理想情形的偏离．同时这些微缺陷也改变了光在薄膜和基底中的传播特性，因此反射相移和相位差均偏离理想情

Based on the theory of inhomogeneous thin films, a model for refractive index of stratified dielectric substrate is firstly put forward. The substrate can be divided into surface layer, subsurface layer and bulk layer in turn. Both the surface layer and subsurface layer, whose refractive indices obey statistical distributions, are equivalent to inhomogeneous thin films. They can be separated into N-1 and N-2 sublayers respetively which are regarded as homogenous thin films. Subsequently, theoretical analysis was carried out utilizing the characteristic matrix method of optical thin films. Numerical calculation for optical properties of single layer dielectric thin films was carried out. The computing results indicate that microdefects in surface layer and subsurface layer of the substrate alter the equivalent refractive indices of the thin film and the substrate, which leads to the deviation of pseudo-Brewster angles and assembling reflectance from ideal conditions. Meanwhile, these microdefects change the propagation characteristics in thin film and substrate, as a result the phase shift of reflection and phase difference deviate from ideal conditions. In addition, this model is also suitable for calculating the influence of microdefects in the substrate on optical propertied of multilayer dielectric thin films.