双源共蒸法制备非均匀膜的模型分析


Autoria(s): 沈自才; 王英剑; 范正修; 邵建达
Data(s)

2005

Resumo

探讨了双源共蒸法制备非均匀薄膜的堆积模型,并给出了非均匀膜的沉积速率与两种膜料沉积速率的关系.当两种膜料的沉积单分子大小近似相等或者小分子沉积速率远大于大分子时,可以近似认为混合介质膜的沉积速率等于两种膜料的沉积速率之和;当两种膜料的沉积单分子大小不满足近似相等且两种膜料的沉积速率可比较时,非均匀膜的沉积速率不能简单地用两种膜料的沉积速率之和来近似,它将随两种膜料沉积单分子的大小不同和沉积速率比不同按照不同的规律变化,并在文中给出了不同情况下的非均匀膜的沉积速率变化规律。

A practical modeling for inhomogeneous coatings, which are prepared by double-source co-evaporation, is proposed in this paper, and then, the relationship between the deposition rate of inhomogeneous coatings and that of double-sources co-vaporation is discussed. The deposition rate of inhomogeneous coatings is close to the sum of the evaporation of the two materials when their bulks are close to or the amount of small molecules is far more than big ones. When the bulks of molecules of the two materials is different, the deposition rate of inhomogeneous coatings will vary with the ratio of their bulks and their deposition rates. Some deposition rates of inhomogeneous coatings in different situations are also detailed in this paper.

Identificador

http://ir.siom.ac.cn/handle/181231/4126

http://www.irgrid.ac.cn/handle/1471x/12640

Idioma(s)

中文

Fonte

沈自才;王英剑;范正修;邵建达.双源共蒸法制备非均匀膜的模型分析,物理学报,2005,54(1):295-301

Palavras-Chave #光学薄膜 #近似 #非均匀 #相等 #单分子 #沉积速率 #介质膜 #薄膜 #大小 #堆积 #模型分析 #inhomogeneous coatings #co-evaporation #modeling
Tipo

期刊论文