Polishing of (1 0 0) γ-LiAlO2 wafer and its effect on the epitaxial growth of ZnO films by MOCVD

Autoria(s): Hui Lin; Shengming Zhou; Hao Teng; Tingting Jia; Xiaorui Hou; Shulin Gu; Shunming Zhu; Zili Xie; Ping Han; Rong Zhang
Data(s)

2009
Identificador

http://ir.siom.ac.cn/handle/181231/6499

http://www.irgrid.ac.cn/handle/1471x/12595
Idioma(s)

中文
Fonte

Hui Lin, Shengming Zhou, Hao Teng, Tingting Jia, Xiaorui Hou, Shulin Gu, Shunming Zhu, Zili Xie, Ping Han, Rong Zhang.Polishing of (1 0 0) γ-LiAlO2 wafer and its effect on the epitaxial growth of ZnO films by MOCVD.Journal of Alloys and Compounds,2009,479:
Palavras-Chave #其他
Tipo

期刊论文
Acesso ao item digital