Growth and characterization of ZnO films on (0 0 1), (1 0 0) and (0 1 0) LiGaO<inf>2</inf> substrates


Autoria(s): Huang Taohua; 周圣明; Teng Hao; Lin Hui; Wang Jun; Han Ping; Zhang Rong
Data(s)

2008

Resumo

ZnO films were fabricated on LiGaO2 (0 0 1), (10 0) and (0 10) planes by RF magnetron sputtering. The structural, morphological and optical properties of as-grown ZnO films were investigated by X-ray diffraction (XRD), atomic force microscopy (AFM), Raman spectra and photoluminescence (PL) spectra. It is found that the orientation of ZnO films is strongly dependent on the substrate plane. [0 0 0 11, [1 (1) over bar 00] and [11 (2) over bar0] oriented ZnO films are deposited on LiGaO2 (001), (100) and (010), respectively. AFM shows the (0001) ZnO film consists of well-aligned regular hexagonal grains. Raman spectra reveal a tensile stress in the (0 0 0 1) ZnO film and a compressive stress in (110 0) and (112 0) ZnO films. PL spectra of all ZnO films exhibit only a near-band-edge UV emission peak. (C) 2008 Elsevier B.V. All rights reserved.

Identificador

http://ir.siom.ac.cn/handle/181231/6113

http://www.irgrid.ac.cn/handle/1471x/12531

Idioma(s)

英语

Fonte

Huang Taohua;周圣明;Teng Hao;Lin Hui;Wang Jun;Han Ping;Zhang Rong .,J. Cryst. Growth,2008,310(13):3144-3148

Palavras-Chave #光学材料;晶体 #atomic force microscopy #X-ray diffraction #LiGaO2 substrate #ZnO films
Tipo

期刊论文