Sm:GdVO_4晶体的生长及光谱性能研究
Data(s) |
2008
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Resumo |
应用中频感应提拉法生长出掺杂浓度为2%原子分数的Sm:GdVO4晶体,研究了室温下c轴方向Sm:GdVO4晶体的吸收和荧光光谱。通过J-O理论计算出强度参数(Ωt),同时计算了对应于4G5/2能级的自发跃迁几率、荧光分支比和辐射寿命。通过荧光光谱计算了对应于566、604和646nm三个发射峰对应的发射截面,结果表明,Sm:GdVO4在604nm的发射截面最大,是掺Sm:YAP在607nm处发射截面的4.4倍。 The 2at.% Sm:GdVO<sub>4</sub> crystal was grown by the Czochralski method. The absorption and fluorescence spectra along the crystallographic axis c were measured at room temperature. Judd-Ofelt theory was used to calculate the intensity parameters (Ωt), the spontaneous emission probability, the branching ratio and the radiative lifetime of the state <sup>4</sup>G<sub>5/2</sub>. The peak emission cross-sections were also estimated at 566, 604 and 646 nm wavelengths. The emission cross-section at 604 nm is 7.62 × 10<sup>-21</sup> cm<sup>2</sup>, 4.4 times lager than that in Sm:YAP at 607 nm. |
Identificador | |
Idioma(s) |
中文 |
Fonte |
何晓明;张连翰;陈光珠;何明珠;杭寅.Sm:GdVO_4晶体的生长及光谱性能研究,人工晶体学报,2008,37(3):514- |
Palavras-Chave | #光学材料;晶体 |
Tipo |
期刊论文 |