非晶硅薄膜制备及其晶化特性研究

用磁控溅射法在K9玻璃上沉积了非晶硅（a—Si）膜和a—Si／Al膜，并将其在流动的N2气氛下进行退火。对退火前后的样品进行Raman光谱、XRD和SEM表征和分析。Raman光谱表明随着退火温度的升高，a-Si膜的散射峰出现了明显的蓝移，但XRD结果表明薄膜仍为非晶态；而a—Si／Al膜在温度很低时就已经开始晶化。

a-Si and a-Si/Al films on K9 glasses were prepared by magnetron sputtering. The films were annealed at flowing N<inf>2</inf> atmosphere. The films before and after annealing were investigated by Raman spectra, XRD and SEM. Raman spectra indicate that the scattering peaks of a-Si films have an obvious blueshift with the increase of annealing temperature, but the films are still amorphous according to the XRD results. However, a-Si/Al films began to crystallize at low temperature.