化学抛光和退火对钛酸锶基片表面改性研究

Atomic force microscopy (AFM) was applied to study the surface morphology of SrTiO<inf>3</inf> substrates which were polished by traditional mechanical and chemical mechanical method respectively. The influence of anneal was also studied. Results show that the RMS of CMP STO substrates can be 0.214 nm. Compared the rocking curve of the unannealed STO substrates with the annealed ones, it indicates that anneal can improve the crystal quality.