Nonpolar m-plane thin film GaN and InGaN/GaN light-emitting diodes on LiAlO2(100) substrates
Data(s) |
2007
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Resumo |
The nonpolar m-plane (1 (1) over bar 00) thin film GaN and InGaN/GaN light-emitting diodes (LEDs) grown by metal-organic chemical vapor deposition on LiAlO2 (100) substrates are reported. The LEDs emit green light with output power of 80 mu W under a direct current of 20 mA for a 400x400 mu m(2) device. The current versus voltage (I-V) characteristic of the diode shows soft rectifying properties caused by defects and impurities in the p-n junction. The electroluminescence peak wavelength dependence on injection current, for currents in excess of 20 mA, saturates at 515-516 nm. This proves the absence of polarization fields in the active region present in c-plane structures. The light output intensity versus current (L-I) characteristic of the diode exhibits a superlinear relation at low injection current caused by nonradiative centers providing a shunt path and a linear light emission zone at high current level when these centers are saturated. (c) 2007 American Institute of Physics. |
Identificador | |
Idioma(s) |
英语 |
Fonte |
Liu B.;Zhang R.;Xie Z. L.;Liu C. X.;Kong J. Y.;Yao J.;Liu Q. J.;Zhang Z.;Fu D. Y.;Xiu X. Q.;Lu H.;Chen P.;Han P.;Gu S. L.;Shi Y.;Zheng Y. D.;Zhou J.;Zhou S. M..,Appl. Phys. Lett.,2007,91(25):253506- |
Palavras-Chave | #光学材料;晶体 #NITRIDE |
Tipo |
期刊论文 |