Nonpolar m-plane thin film GaN and InGaN/GaN light-emitting diodes on LiAlO2(100) substrates


Autoria(s): Liu B.; Zhang R.; Xie Z. L.; Liu C. X.; Kong J. Y.; Yao J.; Liu Q. J.; Zhang Z.; Fu D. Y.; Xiu X. Q.; Lu H.; Chen P.; Han P.; Gu S. L.; Shi Y.; Zheng Y. D.; Zhou J.; Zhou S. M.
Data(s)

2007

Resumo

The nonpolar m-plane (1 (1) over bar 00) thin film GaN and InGaN/GaN light-emitting diodes (LEDs) grown by metal-organic chemical vapor deposition on LiAlO2 (100) substrates are reported. The LEDs emit green light with output power of 80 mu W under a direct current of 20 mA for a 400x400 mu m(2) device. The current versus voltage (I-V) characteristic of the diode shows soft rectifying properties caused by defects and impurities in the p-n junction. The electroluminescence peak wavelength dependence on injection current, for currents in excess of 20 mA, saturates at 515-516 nm. This proves the absence of polarization fields in the active region present in c-plane structures. The light output intensity versus current (L-I) characteristic of the diode exhibits a superlinear relation at low injection current caused by nonradiative centers providing a shunt path and a linear light emission zone at high current level when these centers are saturated. (c) 2007 American Institute of Physics.

Identificador

http://ir.siom.ac.cn/handle/181231/5969

http://www.irgrid.ac.cn/handle/1471x/12459

Idioma(s)

英语

Fonte

Liu B.;Zhang R.;Xie Z. L.;Liu C. X.;Kong J. Y.;Yao J.;Liu Q. J.;Zhang Z.;Fu D. Y.;Xiu X. Q.;Lu H.;Chen P.;Han P.;Gu S. L.;Shi Y.;Zheng Y. D.;Zhou J.;Zhou S. M..,Appl. Phys. Lett.,2007,91(25):253506-

Palavras-Chave #光学材料;晶体 #NITRIDE
Tipo

期刊论文