r面白宝石单晶的温梯法生长及缺陷研究


Autoria(s): 彭观良; 周国清; 庄漪; 邹军; 王银珍; 李抒智; 杨卫桥; 周圣明; 徐军
Data(s)

2005

Resumo

本文描述使用温梯法(TGT)生长(1-↑102)方向的白宝石单晶,应用X射线双晶摇摆曲线(XRC)测定了晶体内部的完整性,再利用KOH熔体腐蚀出样品的r面(1-↑102)上的位错蚀坑,借助扫描电子显微镜(SEM)进行观察,发现r面白宝石的位错腐蚀坑呈等腰三角形,并且有台阶状结构,并分析了位错的成因。

A high quality sapphire single crystal oriented along (11 over-bar 02) was grown by the temperature gradient technique (TGT) and the crystal quality was investigated using X-ray rocking curve (XRC). The etch pits of dislocations were revealed on the r-plane (11 over-bar 02) sapphire by using a melted KOH as etchants. Scanning electron microscope (SEM) demonstrates that the shapes of etch pits located in r-plane of sapphire look like a isosceles triangle with sidestep-like structure. And the mechanism of the formation of dislocations was discussed.

Identificador

http://ir.siom.ac.cn/handle/181231/5883

http://www.irgrid.ac.cn/handle/1471x/12416

Idioma(s)

中文

Fonte

彭观良;周国清;庄漪;邹军;王银珍;李抒智;杨卫桥;周圣明;徐军.r面白宝石单晶的温梯法生长及缺陷研究,人工晶体学报,2005,34(4):653-656

Palavras-Chave #光学材料;晶体 #温梯法 #r面白宝石 #位错 #化学腐蚀 #腐蚀坑 #缺陷
Tipo

期刊论文