Growth and properties of ZnO thin film on beta-Ga2O3(100) substrate by pulsed laser deposition


Autoria(s): Zhang Jungang; Li Bin; 夏长泰; Deng Qun; 徐军; 裴广庆; Wu Feng; Wu Yongqing; Shi Hongsheng; Xu Wusheng; Yang Zhaohui
Data(s)

2006

Resumo

Zinc oxide (ZnO) thin films were grown on the beta-Ga2O3 (100) substrate by pulsed laser deposition (PLD). X-ray diffraction (XRD) indicated that the ZnO films are c-axis oriented. The optical and electrical properties of the films were investigated. The room temperature Photoluminescence (PL) spectrum showed a near band emission at 3.28 eV with two deep level emissions. Optical absorption indicated a visible exciton absorption at room temperature. The as-grown films had good electrical properties with the resistivities as low as 0.02 Omega cm at room temperature. Thus, beta-Ga2O3 (100) substrate is shown to be a suitable substrate for fabricating ZnO film. (c) 2006 Elsevier B.V. All rights reserved.

Identificador

http://ir.siom.ac.cn/handle/181231/5517

http://www.irgrid.ac.cn/handle/1471x/12230

Idioma(s)

英语

Fonte

Zhang Jungang;Li Bin;夏长泰;Deng Qun;徐军;裴广庆;Wu Feng;Wu Yongqing;Shi Hongsheng;Xu Wusheng;Yang Zhaohui.,J. Cryst. Growth,2006,296(2):186-190

Palavras-Chave #光学材料;晶体 #atomic force microscopy #characterization #floating zone technique #laser epitaxy #zinc compounds #semiconducting materials
Tipo

期刊论文