Low loss waveguide in Nd3+-doped silicate glass fabricated by carbon ion implantation


Autoria(s): Li SL; Wang KM; Chen F; Wang XL; Fu G; Lu QM; Hu LL; Shen DY; Ma HJ; Nie R
Data(s)

2005

Resumo

Low loss index enhanced planar waveguides in Nd3+-doped silicate glass were fabricated by 3.0 MeV C+ ion implantation. The enhancement of the refractive index confined the light propagating in the waveguide. The prism-coupling method was used to measure dark modes in the waveguide. The effective refractive indices of the waveguide were obtained based on the dark modes. The moving fiber method was applied to measure the waveguide propagation loss. Loss measured in non-annealed samples is about 0.6 dB/cm. And the waveguide mode optical near-field output at 633 nm was presented. (c) 2005 Elsevier B.V. All rights reserved.

Identificador

http://ir.siom.ac.cn/handle/181231/5251

http://www.irgrid.ac.cn/handle/1471x/11979

Idioma(s)

英语

Fonte

Li SL;Wang KM;Chen F;Wang XL;Fu G;Lu QM;Hu LL;Shen DY;Ma HJ;Nie R.,Surf. Coat. Technol.,2005,200(1~4):598-601

Palavras-Chave #ion implantation #planar waveguide #Nd3+-doped silicate glass #propagation loss
Tipo

期刊论文