掺铒高硅氧玻璃光谱性质的研究

应用Judd-Oflet理论计算了新型掺铒高硅氧玻璃中铒离子的强度参量Ωt（t=2，4，6），Ω2=8．15×10^-20,Ω4=1．43×10^-20,Ω6=1．22×10^-20，相比于其他氧化物玻璃，表现出较大的Ω2,6值，反映了铒离子周围的近邻结构不对称性和Er-O键的离子键成分较高．利用McCumber理论计算得到了能级4I13/2→4I15/2跃迁的受激发射截面为σc=O．51pm^2．这种高硅氧玻璃掺铒离子浓度尽管高于石英光纤的掺杂浓度10倍左右，其荧光寿命和量子效率仍达到6．0ms和66．

The Judd-Ofelt intensity parameter Omega(t) of a novel Er3+ doped high silica glass was calculated. The large values Of Omega(2.6) ( Omega(2) 8.15 x 10(-20), Omega(6) = 1.22 x 10(-20)) indicate that the local structure of Er3+ has higher asymmetry and lower covalency than other oxide glasses. McCumber theory was used to calculate the stimulated emission cross section of I-4(13/2) -> I-4(15/2) transition, the result was 0.51 pm(2). Despite the Er3+ -doped concentration in high silica glass being about ten times greater than that in silica fiber, its fluorescence lifetime and quantum efficiency were 6.0ms and 66.0%, respectively. This novel Er3+ -doped glass can be used in optical amplification and microchip laser.