A large-area photolithography technique based on surface plasmons leakage modes
Data(s) |
2008
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Resumo |
An atomic force microscope (AFM) assisted surface plasmons leakage radiation photolithography technique has been numerically demonstrated by using two-dimensional finite-difference time-domain (2D-FDTD) method. With the aid of a metallic AFM tip, particular characteristic of the Kretstchmann configuration to excite surface plasmons (SPs) is utilized to achieve large-area patterns with high spatial resolution and contrast, the photoresist could be exposed with low power laser due to the remarkable local field enhancement at the metal/dielectric interface and the resonant localized SPs modes near the tip. Good tolerance on the film thickness and incident angle has been obtained, which provides a good practicability for experiments. This photolithography technique proposed here can realize large-area, high-resolution, high-contrast, nondestructive, arbitrary-structure fabrication of nanoscale devices. (c) 2007 Elsevier B.V. All rights reserved. |
Identificador | |
Idioma(s) |
英语 |
Fonte |
Yuan Guanghui;Wang Pei;Lu Yonghua;Cao Yong;Zhang Douguo;Ming Hai;徐文东 .,Opt. Commun.,2008,281(9):2680-2684 |
Palavras-Chave | #光存储 #photolithography #surface plasmons |
Tipo |
期刊论文 |