氧化铋薄膜用于蓝光可录存储的研究

利用直流磁控溅射法在不同氧氩分压比条件下制备了BiOx薄膜。通过对薄膜在蓝光作用前后的反射率对比度变化的研究发现，氧氩分压比为50％时制备的薄膜具有最佳的光学对比度。利用X射线衍射仪(XRD)、X光电子能谱(XPS)和光谱仪研究了薄膜热处理前后的结构和光谱性质的变化。研究结果表明薄膜光学性质变化主要由薄膜中氧化铋的相变引起。蓝光静态测试结果显示氧氩分压比为50％条件下制备的BiOx薄膜具有很好好的记录敏感度，在11mW的记录功率和800ns的记录脉宽条件下，得到了52％的反射率对比度。此外，BiOx薄膜表现出了非常好的读出稳定性。

BiO<inf>2</inf> films are prepared by reactive direct current (DC) magnetron sputtering from a metallic bismuth target in Ar + O<inf>2</inf> with different O<inf>2</inf>/Ar ratios. It is found that the optical property of BiO<inf>x</inf> films is sensitive to O<inf>2</inf>/Ar ratios and the films deposited at O<inf>2</inf>/Ar ratio of 0.5 have the best reflectivity contrast under the same conditions. The structure and optical characteristics of the films are studied by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), and spectrophotometer. As revealed by investigations, the phase transition is mainly responsible for the change of optical properties. The static test results indicate that the BiO<inf>x</inf> films have good writing sensitivity for blue laser beams. A high reflectivity contrast of about 52% at a writing power of 11 mW and writing pulse width of 800 ns is obtained. In addition, the films demonstrate good stability after being read for 10000 times.