A humidity-resistant highly sensitive holographic photopolymerizable dry film


Autoria(s): Gong QX; Wang SL; Huang MJ; 干福熹
Data(s)

2005

Resumo

A new humidity-resistant highly sensitive acrylamide-based photopolymeric holographic recording material has been developed. The photopolymer is resistant to the humidity of environment. Diffraction efficiencies near 50% are obtained with exposure energy of 60 mJ/cm(2) in materials of 150 mu m. thickness. Diphenyl iodonium chloride is added to the material and can increase the exposure sensitivity by a factor of more than 4 (to about 28 mJ/cm(2)). An image has been successfully stored in the material with a small distortion. (C) 2005 Elsevier B.V. All rights reserved.

Identificador

http://ir.siom.ac.cn/handle/181231/3923

http://www.irgrid.ac.cn/handle/1471x/11342

Idioma(s)

英语

Fonte

Gong QX;Wang SL;Huang MJ;干福熹.,Mater. Lett.,2005,59(23):2969-2972

Palavras-Chave #光存储 #photopolymer #holographic recording #exposure sensitivity #diffraction efficiency
Tipo

期刊论文