Femtosecond laser-induced crystallization in amorphous Ge2Sb2Te5 films


Autoria(s): 张广军; 顾冬红; 干福熹; 姜雄伟; 陈清席
Data(s)

2005

Resumo

Crystallization in amorphous Ge2Sb2Te5 films by irradiation with femtosecond laser was investigated. The reflectivity and X-ray diffraction measurements confirmed that the crystalline state has been achieved in amorphous Ge2Sb2Te5 films under the irradiation of fermosecond laser with an average power of 65 mW at a frequency of 1000 Hz and a pulsed width of 120 fs. The surface morphology before and after femtosecond laser irradiation was studied by scanning electron microscope; results showed that the surface of films with irradiation of femtosecond laser was composed of some the crystallized micro-region. (C) 2004 Elsevier B.V. All rights reserved.

Identificador

http://ir.siom.ac.cn/handle/181231/3777

http://www.irgrid.ac.cn/handle/1471x/11268

Idioma(s)

英语

Fonte

张广军;顾冬红;干福熹;姜雄伟;陈清席.,Thin Solid Films,2005,474(1-2):169-172

Palavras-Chave #光存储 #femtosecond laser #crystallization #amorphous materials #annealing
Tipo

期刊论文