Effect of elliptical manufacture error of an axicon on the diffraction-free beam patterns
Data(s) |
2008
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Resumo |
Based on the generalized Huygens-Fresnel diffraction integral theory and the stationary-phase method, we analyze the influence on diffraction-free beam patterns of an elliptical manufacture error in an axicon. The numerical simulation is compared with the beam patterns photographed by using a CCD camera. Theoretical simulation and experimental results indicate that the intensity of the central spot decreases with increasing elliptical manufacture defect and propagation distance. Meanwhile, the bright rings around the central spot are gradually split into four or more symmetrical bright spots. The experimental results fit the theoretical simulation very well. (C) 2008 Society of Photo-Optical Instrumentation Engineers. National Natural Science Foundation of China [60477041]; Fujian Provincial Natural Science Foundation of China [A0410017, A0710011] |
Identificador | |
Idioma(s) |
英语 |
Fonte |
Zeng Xiahui;Wu Fengtie.,Opt. Eng.,2008,47(8):83401- |
Palavras-Chave | #diffraction-free beam pattern #Bessel beam #elliptical manufacture error #axicon #spot array |
Tipo |
期刊论文 |