甲基化对多孔SiO_2增透薄膜光学稳定性能的影响

分别通过引入甲基三乙氧基硅烷(MTES)、二甲基二乙氧基硅烷(DMDES)以及六甲基二硅氮烷(HMDS)组分对SiO2悬胶体进行改性,得到不同甲基化的多孔SiO2改性薄膜。研究了改性薄膜的光学稳定性,抗激光破坏性能以及机械抗擦性能。结果表明,HMDS改性薄膜的光学稳定性最好而机械抗擦性较弱,MTES与DMDES改性薄膜的光学稳定性较低而机械抗擦性良好且均与改性组分的含量有关,甲基化改性薄膜的抗激光破坏性能比未改性薄膜的有所降低。

Different methyl-modified porous silica antireflective coatings were prepared from the silica suspension with introducing the prepolymer of methyltriethoxysilane (MTES), the prepolymer of dimethyldiethoxysilane (DMDES), and hexamethyldisizane (HMDS) as mono-, di- and tri-methyl modifiers respectively. Optical stability and laser damage resistance are investigated in detail, as well as abrasive-resistance. It is showed that HMDS-modified silica coatings posses better optical stability and poorer abrasive-resistance than mono-, di-methyl modified coatings. The properties of the later two modified coatings are proved to be related to their content. In comparison with unmodified silica coatings, laser damage resistance of methyl-modified coatings tend to low.