Impact of polarized illumination on high NA imaging in ArF immersion lithography at 45nm node

Autoria(s): Qiongyan Yuan; Xiangzhao Wang; Zicheng Qiu
Data(s)

2009
Identificador

http://ir.siom.ac.cn/handle/181231/6592

http://www.irgrid.ac.cn/handle/1471x/10751
Idioma(s)

中文
Fonte

Qiongyan Yuan, Xiangzhao Wang, Zicheng Qiu.Impact of polarized illumination on high NA imaging in ArF immersion lithography at 45nm node.Optik,2009,120(7):
Palavras-Chave #光学
Tipo

期刊论文
Acesso ao item digital