Deep-etched high-density fused-silica transmission gratings with high efficiency at a wavelength of 1550 nm
Data(s) |
2006
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Resumo |
We describe the design, fabrication, and excellent performance of an optimized deep-etched high-density fused-silica transmission grating for use in dense wavelength division multiplexing (DWDM) systems. The fabricated optimized transmission grating exhibits an efficiency of 87.1% at a wavelength of 1550 nm. Inductively coupled plasma-etching technology was used to fabricate the grating. The deep-etched high-density fused-silica transmission grating is suitable for use in a DWDM system because of its high efficiency, low polarization-dependent loss, parallel demultiplexing, and stable optical performance. The fabricated deep-etched high-density fused-silica transmission gratings should play an important role in DWDM systems. (c) 2006 Optical Society of America. |
Identificador | |
Idioma(s) |
英语 |
Fonte |
Wang SQ;周常河;Zhang YY;Ru HY.,Appl. Optics,2006,45(12):2567-2571 |
Tipo |
期刊论文 |