Deep-etched high-density fused-silica transmission gratings with high efficiency at a wavelength of 1550 nm


Autoria(s): Wang SQ; 周常河; Zhang YY; Ru HY
Data(s)

2006

Resumo

We describe the design, fabrication, and excellent performance of an optimized deep-etched high-density fused-silica transmission grating for use in dense wavelength division multiplexing (DWDM) systems. The fabricated optimized transmission grating exhibits an efficiency of 87.1% at a wavelength of 1550 nm. Inductively coupled plasma-etching technology was used to fabricate the grating. The deep-etched high-density fused-silica transmission grating is suitable for use in a DWDM system because of its high efficiency, low polarization-dependent loss, parallel demultiplexing, and stable optical performance. The fabricated deep-etched high-density fused-silica transmission gratings should play an important role in DWDM systems. (c) 2006 Optical Society of America.

Identificador

http://ir.siom.ac.cn/handle/181231/1992

http://www.irgrid.ac.cn/handle/1471x/10521

Idioma(s)

英语

Fonte

Wang SQ;周常河;Zhang YY;Ru HY.,Appl. Optics,2006,45(12):2567-2571

Tipo

期刊论文