Investigations of the conductor-semiconductor interface


Autoria(s): Scranton, Robert A.
Data(s)

1978

Resumo

<p>I. Schottky barriers produced by polymeric sulfur nitride, (SN)<sub>x</sub>, on nine common III-V and II-VI compound semiconductors are compared to barriers formed by Au. The conductor (SN)<sub>x</sub> produces significantly higher barriers to n-type semiconductors and lower barriers to p-type semiconductors than Au, the most electronegative elemental metal. The barrier height improvement, defined as ɸ(SN)<sub>x</sub> - ɸ(Au), is smaller on covalent semiconductors than on ionic semiconductors; (SN)x barriers follow the ionic-covalent transition. Details of (SN)<sub>x</sub> film deposition, samples preparation, and barrier height measurements are described.</p> <p>II. The rate of dissolution of amorphous Si into solid Al is measured. The rate of movement of the amorphous Si/Al interface is found to be much faster than predicted by a simple model of the transport of Si through Al. This result is related to defects in the growth of epitaxial Si using the solid phase epitaxy process.</p>

Formato

application/pdf

Identificador

http://thesis.library.caltech.edu/8582/1/Scranton_ra_1978.pdf

Scranton, Robert A. (1978) Investigations of the conductor-semiconductor interface. Dissertation (Ph.D.), California Institute of Technology. http://resolver.caltech.edu/CaltechTHESIS:07222014-101031867 <http://resolver.caltech.edu/CaltechTHESIS:07222014-101031867>

Relação

http://resolver.caltech.edu/CaltechTHESIS:07222014-101031867

http://thesis.library.caltech.edu/8582/

Tipo

Thesis

NonPeerReviewed