Mechanisms in fs-laser ablation in fused silica
Data(s) |
2004
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Resumo |
A theoretical model is proposed to describe the microscopic processes involved in the ablation in fused silica induced by femtosecond-laser pulse. Conduction-band electron (CBE) can absorb laser energy, the rate is calculated by quantum mechanical method and classical method. CBE is produced via photoionization (PI) and impact ionization (II). The PI and II rates are calculated by using the Keldysh theory and double-flux model, respectively. Besides the CBE production, we investigate laser energy deposition and its distribution. The equation of energy diffusion in physical space is resolved numerically. Taking energy density E-dep=54 kJ/cm(3) as the criterion, we calculate damage threshold, ablation depth, and ablation volumes. It is found that if energy diffusion is considered, energy density near sample surface is reduced to 1/10, damage threshold is enhanced more than 30%, ablation depth is increased by a factor of 10. Our theoretical results agree well with experimental measurements. Several ultrafast phenomena in fused silica are also discussed. (C) 2004 American Institute of Physics. |
Identificador | |
Idioma(s) |
英语 |
Fonte |
贾天卿;徐至展;李儒新;冯东海;Li XX;Cheng CF;Sun HY;Xu NS;Wang HZ.,J. Appl. Phys.,2004,95(9):5166-5171 |
Palavras-Chave | #FEMTOSECOND OPTICAL-BREAKDOWN #SUBPICOSECOND PULSES #PHOTON-ABSORPTION #IMPACT IONIZATION #CONDUCTION-BAND #INDUCED DAMAGE #DIELECTRICS #SIO2 #RELAXATION #NANOSECOND |
Tipo |
期刊论文 |