A thin liquid film and its effects in an atomic force microscopy measurement


Autoria(s): 林静; 郑志军; 虞吉林; 白以龙
Data(s)

2009

Resumo

Recently, it has been observed that a liquid film spreading on a sample surface will significantly distort atomic force microscopy (AFM) measurements. In order to elaborate on the effect, we establish an equation governing the deformation of liquid film under its interaction with the AFM tip and substrate. A key issue is the critical liquid bump height y(0c) at which the liquid film jumps to contact the AFM tip. It is found that there are three distinct regimes in the variation of y(0c) with film thickness H, depending on Hamaker constants of tip, sample and liquid. Noticeably, there is a characteristic thickness H* physically defining what a thin film is; namely, once the film thickness H is the same order as H* , the effect of film thickness should be taken into account. The value of H* is dependent on Hamaker constants and liquid surface tension as well as tip radius.

National Natural Scientific Foundation of China 10721202 10432050 10772012 10732090 Knowledge Innovation Project of Chinese Academy of Sciences KJCX2-YW-M04

Identificador

http://dspace.imech.ac.cn/handle/311007/28791

http://www.irgrid.ac.cn/handle/1471x/8820

Idioma(s)

英语

Fonte

Chinese Physics Letters.2009,26(8):086802(1-4)

Tipo

期刊论文