Mn implanted GaAs by low energy ion beam deposition


Autoria(s): Song SL; 陈诺夫; Zhou JP; Yin ZG; Li YL; Yang SY; Liu ZK
Data(s)

2004

Resumo

High dose Mn was implanted into semi-insulating GaAs substrate to fabricate embedded ferromagnetic Mn-Ga binary particles by mass-analyzed dual ion beam deposit system at room temperature. The properties of as-implanted and annealed samples were measured with X-ray diffraction, high-resolution X-ray diffraction to characterize the structural changes. New phase formed after high temperature annealing. Sample surface image was observed with atomic force microscopy. All the samples showed ferromagnetic behaviour at room temperature. There were some differences between the hysteresis loops of as-implanted and annealed samples as well as the cluster size of the latter was much larger than that of the former through the surface morphology. (C) 2004 Elsevier B.V. All rights reserved.

Identificador

http://dspace.imech.ac.cn/handle/311007/33809

http://www.irgrid.ac.cn/handle/1471x/2753

Idioma(s)

英语

Fonte

Journal of Crystal Growth.2004,264(1-3):31-35

Palavras-Chave #X-Ray Diffraction #Ion Beam Deposit #Magnetic Materials #Semiconducting Gallium Arsenide #Curie-Temperature #Semiconductors #Ferromagnetism #System #Mn)As #(Ga #Gan
Tipo

期刊论文