Thickness And Component Distributions Of Yttrium-Titanium Alloy Films In Electron-Beam Physical Vapor Deposition


Autoria(s): 李帅辉; 舒勇华; 樊菁
Data(s)

2008

Resumo

Thickness and component distributions of large-area thin films are an issue of international concern in the field of material processing. The present work employs experiments and direct simulation Monte Carlo (DSMC) method to investigate three-dimensional low-density, non-equilibrium jets of yttrium and titanium vapor atoms in an electron-beams physical vapor deposition (EBPVD) system furnished with two or three electron-beams, and obtains their deposition thickness and component distributions onto 4-inch and 6-inch mono-crystal silicon wafers. The DSMC results are found in excellent agreement with our measurements, such as evaporation rates of yttrium and titanium measured in-situ by quartz crystal resonators, deposited film thickness distribution measured by Rutherford backscattering spectrometer (RBS) and surface profilometer and deposited film molar ratio distribution measured by RBS and inductively coupled plasma atomic emission spectrometer (ICP-AES). This can be taken as an indication that a combination of DSMC method with elaborate measurements may be satisfactory for predicting and designing accurately the transport process of EBPVD at the atomic level.

Identificador

http://dspace.imech.ac.cn/handle/311007/25928

http://www.irgrid.ac.cn/handle/1471x/2464

Idioma(s)

英语

Fonte

Science In China Series E-Technological Sciences, 2008, 51(9): 1470-1482

Palavras-Chave #Electron Beam Physical Vapor Deposition #Thin Film #Thickness And Species Distributions #Vapor Atom #Nonequilibrium Transport #Monte-Carlo-Simulation #Sphere Model #Evaporation
Tipo

期刊论文