Analysis of residual stress gradient in MEMS multi-layer structure


Autoria(s): Qian J(钱劲); Zhao YP(赵亚溥); Zhu RC(朱如曾)
Data(s)

2002

Resumo

Residual stress and its gradient through the thickness are among the most important properties of as-deposited films. Recently, a new mechanism based on a revised Thomas-Fermi-Dirac (TFD) model was proposed for the origin of intrinsic stress in solid film

Identificador

http://dspace.imech.ac.cn/handle/311007/16412

http://www.irgrid.ac.cn/handle/1471x/1071

Idioma(s)

英语

Fonte

International Journal of Nonlinear Sciences and Numerical Simulation,2002,3(0):727-730

Palavras-Chave #力学
Tipo

期刊论文