Diffusion mechanisms in the Fe3ASi


Autoria(s): 陈永冲; 张永刚; 魏炳忱
Data(s)

2003

Resumo

In this paper, the possible reasons for the high thermal vacancy concentration and the low migration barriers for the Fe atom diffusion in the DO3 structure Fe3Si have been discussed.

Identificador

http://dspace.imech.ac.cn/handle/311007/16219

http://www.irgrid.ac.cn/handle/1471x/888

Palavras-Chave #力学
Tipo

期刊论文