Diffusion mechanisms in the Fe3ASi
Data(s) |
2003
|
---|---|
Resumo |
In this paper, the possible reasons for the high thermal vacancy concentration and the low migration barriers for the Fe atom diffusion in the DO3 structure Fe3Si have been discussed. |
Identificador | |
Palavras-Chave | #力学 |
Tipo |
期刊论文 |