Graphene as a diffusion barrier for isomorphous systems: Cu-Ni system


Autoria(s): Roy, Apurba; Kumar, Punith MK; Srivastava, Chandan
Data(s)

2016

Resumo

Electrochemical exfoliation technique using the pyrophosphate anion derived from tetra sodium pyrophosphate was employed to produce graphene. As-synthesized graphene was then drop dried over a cold rolled Cu sheet. Ni coating was then electrodeposited over bare Cu and graphene-Cu substrates. Both substrates were then isothermally annealed at 800 degrees C for 3 h. WDS analysis showed substantial atomic diffusion in annealed Ni-Cu sample. Cu-graphene-Ni sample, on the other hand, showed negligible diffusion illustrating the diffusion barrier property of the graphene coating. (C) 2016 Elsevier B.V. All rights reserved.

Formato

application/pdf

Identificador

http://eprints.iisc.ernet.in/53394/1/Che_Phy_Let_646_158_2016.pdf

Roy, Apurba and Kumar, Punith MK and Srivastava, Chandan (2016) Graphene as a diffusion barrier for isomorphous systems: Cu-Ni system. In: CHEMICAL PHYSICS LETTERS, 646 . pp. 158-161.

Publicador

ELSEVIER SCIENCE BV

Relação

http://dx.doi.org/10.1016/j.cplett.2016.01.030

http://eprints.iisc.ernet.in/53394/

Palavras-Chave #Materials Engineering (formerly Metallurgy)
Tipo

Journal Article

PeerReviewed