Low temperature sulfurization of electrodeposited Cu(In,Al)Se-2 thin films
Data(s) |
2014
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Resumo |
Sulfurization of Cu(In,Al)Se-2 films is carried out in an indigenously made set up at moderately low temperature. The films are sulfurized for different time durations of 15, 30, 45 and 60 min at 150 degrees C. InSe and Cu2S phases occurred in the films during the initial stage of sulfurization along with Cu(In,Al)(Se,S)(2) phase. The compositional analysis shows that the sulfur incorporation is saturated after 30 min. Crystallinity increased with the increase in sulfurization time. The band gap of the Cu(In,Al)Se-2 film increased up to 1.35 eV with the addition of sulfur. Single phase Cu(In,Al)(Se,S)(2) with high crystallinity is obtained after 60 min of sulfurization. (C) 2014 Elsevier B.V. All rights reserved. |
Formato |
application/pdf |
Identificador |
http://eprints.iisc.ernet.in/50332/1/app_sur_sci_316_424_2014.pdf Shruthi, Lakshmi N and Deepa, KG and Sunil, Anantha M and Nagaraju, Jampana (2014) Low temperature sulfurization of electrodeposited Cu(In,Al)Se-2 thin films. In: APPLIED SURFACE SCIENCE, 316 . pp. 424-428. |
Publicador |
ELSEVIER SCIENCE BV |
Relação |
http://dx.doi.org/ 10.1016/j.apsusc.2014.08.018 http://eprints.iisc.ernet.in/50332/ |
Palavras-Chave | #Instrumentation and Applied Physics (Formally ISU) |
Tipo |
Journal Article PeerReviewed |