A Short-Channel Common Double-Gate MOSFET Model Adapted to Gate Oxide Thickness Asymmetry


Autoria(s): Sharan, Neha; Mahapatra, Santanu
Data(s)

2014

Resumo

Existing compact models for common double-gate (CDG) MOSFETs are based on the fundamental assumption of having symmetric gate oxide thickness. In this paper, we demonstrate that using the unique quasi-linear relationship between the surface potentials, it is possible to develop compact model for CDG-MOSFETs without such approximation while preserving the mathematical complexity at the same level of the existing models. In the proposed model, the surface potential relationship is used to include the drain-induced barrier lowering, channel length modulation, velocity saturation, and quantum mechanical effect in the long-channel model and good agreement is observed with the technology computer aided design simulation results.

Formato

application/pdf

Identificador

http://eprints.iisc.ernet.in/50277/1/ieee_tra_ele_dev_61-8_2732_2014.pdf

Sharan, Neha and Mahapatra, Santanu (2014) A Short-Channel Common Double-Gate MOSFET Model Adapted to Gate Oxide Thickness Asymmetry. In: IEEE TRANSACTIONS ON ELECTRON DEVICES, 61 (8). pp. 2732-2737.

Publicador

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC

Relação

http://dx.doi.org/ 10.1109/TED.2014.2331191

http://eprints.iisc.ernet.in/50277/

Palavras-Chave #Electronic Systems Engineering (Formerly, (CEDT) Centre for Electronic Design & Technology)
Tipo

Journal Article

PeerReviewed