Titanium nitride thin film anode: chemical and microstructural evaluation during electrochemical studies


Autoria(s): Raman, Thulasi KH; Penki, Tirupathi Rao; Munichandraiah, N; Rao, Mohan G
Data(s)

2014

Resumo

TIN thin films with (200) fibre texture are deposited on Cu substrate at room temperature using reactive magnetron sputtering. They exhibit a discharge capacity of 172 mu Ah cm(-2) mu m(-1) (300 mAh g(-1)) in a non-aqueous electrolyte containing a Li salt. There is a graded decrease in discharge capacity when cycled between 0.01 and 3.0 V. Electron microscopy investigations indicate significant changes in surface morphology of the cycled TiN electrodes in comparison with the as deposited TiN films. From XPS depth profile analysis, it is inferred that Li intercalated TIN films consist of lithium compounds, hydroxyl groups, titanium sub oxides and TiN. Lithium diffusivity and reactivity decrease with increase in depth and the major reaction with lithium takes place at film surface and grain boundaries. (C) 2014 Elsevier Ltd. All rights reserved.

Formato

application/pdf

Identificador

http://eprints.iisc.ernet.in/49180/1/ele_act_125_282_2014.pdf

Raman, Thulasi KH and Penki, Tirupathi Rao and Munichandraiah, N and Rao, Mohan G (2014) Titanium nitride thin film anode: chemical and microstructural evaluation during electrochemical studies. In: ELECTROCHIMICA ACTA, 125 . pp. 282-287.

Publicador

PERGAMON-ELSEVIER SCIENCE LTD

Relação

http://dx.doi.org/10.1016/j.electacta.2014.01.104

http://eprints.iisc.ernet.in/49180/

Palavras-Chave #Inorganic & Physical Chemistry #Instrumentation and Applied Physics (Formally ISU)
Tipo

Journal Article

PeerReviewed