Negative differential resistance and effect of defects and deformations in MoS2 armchair nanoribbon metal-oxide-semiconductor field effect transistor


Autoria(s): Sengupta, Amretashis; Mahapatra, Santanu
Data(s)

21/11/2013

Resumo

In this work, we present a study on the negative differential resistance (NDR) behavior and the impact of various deformations (like ripple, twist, wrap) and defects like vacancies and edge roughness on the electronic properties of short-channel MoS2 armchair nanoribbon MOSFETs. The effect of deformation (3 degrees-7 degrees twist or wrap and 0.3-0.7 angstrom ripple amplitude) and defects on a 10 nm MoS2 ANR FET is evaluated by the density functional tight binding theory and the non-equilibrium Green's function approach. We study the channel density of states, transmission spectra, and the I-D-V-D characteristics of such devices under the varying conditions, with focus on the NDR behavior. Our results show significant change in the NDR peak to valley ratio and the NDR window with such minor intrinsic deformations, especially with the ripple. (C) 2013 AIP Publishing LLC.

Formato

application/pdf

Identificador

http://eprints.iisc.ernet.in/48110/1/Jour_App_Phys_114-19_194513_2013.pdf

Sengupta, Amretashis and Mahapatra, Santanu (2013) Negative differential resistance and effect of defects and deformations in MoS2 armchair nanoribbon metal-oxide-semiconductor field effect transistor. In: Journal of Applied Physics, 114 (19). 194513_1-194513_6.

Publicador

American Institute of Physics

Relação

http://dx.doi.org/10.1063/1.4833554

http://eprints.iisc.ernet.in/48110/

Palavras-Chave #Electronic Systems Engineering (Formerly, (CEDT) Centre for Electronic Design & Technology)
Tipo

Journal Article

PeerReviewed